Small desktop high-frequency plasma surface treatment device.

■ Operability and functionality
RF 13.56Mhz 0-300W high-power model, with automatic generator matching, no need to adjust reflected waves, further increasing the convenience of operation.
Equipped with a digital Pirani sensor as standard, it displays the vacuum level in real-time, making control more precise.
Parallel flat plate cavities are very suitable for laboratory processing of relatively pure samples such as wafers and silicon wafers, without worrying about sample contamination due to cavity material.

■ Safety and Protection
Equipped with three layers of alarm lights for temperature, pressure, and abnormal plasma generator, it can monitor and understand the operating status of the machine in real time.
Equipped with safety functions such as overcurrent leakage protection switch, self diagnostic circuit, and buzzer alarm in case of abnormalities.

■ Product advantages
The plasma cleaning machine has good cleaning effect, high cleaning efficiency, high power, and wide application range.
There are no requirements for material, appearance size, etc. for cleaning samples.
During the plasma cleaning process, the temperature rise is very small and can basically reach room temperature treatment.
Efficient specially designed electrodes ensure the generation of uniform plasma.
Specially designed electrodes and tray structures ensure comprehensive and effective cleaning of samples.